The wide bandgap semiconductor gallium nitride (GaN) and related materials are highly attractive for high-power and high-temperature applications [1]. However, instabilities related to material and trapping effects limited the reproducibility and the performance of these devices. A decrease of the drain current, ID, during operation and after repeated measurements has been observed by several authors [2,3], and generically identified as “current collapse”. In this work we have investigated the mechanisms that lead to ID decrease in GaN MESFETs grown by MOCVD on a (0001) sapphire substrate, see Fig. 1, in the attempt to identifying the deep traps involved.

Deep traps related effects in GaN MESFETs grown on sapphire substrate

CHINI, ALESSANDRO;MENEGHESSO, GAUDENZIO;ZANONI, ENRICO;
2000

Abstract

The wide bandgap semiconductor gallium nitride (GaN) and related materials are highly attractive for high-power and high-temperature applications [1]. However, instabilities related to material and trapping effects limited the reproducibility and the performance of these devices. A decrease of the drain current, ID, during operation and after repeated measurements has been observed by several authors [2,3], and generically identified as “current collapse”. In this work we have investigated the mechanisms that lead to ID decrease in GaN MESFETs grown by MOCVD on a (0001) sapphire substrate, see Fig. 1, in the attempt to identifying the deep traps involved.
File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/1353924
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? ND
social impact