The present investigation is devoted to the X-ray photoelectron spectroscopy (XPS) analysis of the main core levels (C 1s, O 1s, Dy 4d, Dy 3d) of a representative dysprosium(III) oxide thin film. The specimen was grown on Si(100) at 500 °C by metal organic chemical vapor deposition (MOCVD) starting from Dy((iPrN)2CNMe2)3 in an N2/O2 atmosphere. The above route yielded uniform and homogeneous nanostructured Dy2O3 films characterized by a remarkable reactivity towards atmospheric CO2 and H2O, resulting in the surface co-presence of dysprosium carbonates/ bicarbonates and hydroxides. The most relevant spectral features are presented and discussed.

Nanostructured Dy2O3 films: an XPS investigation

GASPAROTTO, ALBERTO;TONDELLO, EUGENIO;
2007

Abstract

The present investigation is devoted to the X-ray photoelectron spectroscopy (XPS) analysis of the main core levels (C 1s, O 1s, Dy 4d, Dy 3d) of a representative dysprosium(III) oxide thin film. The specimen was grown on Si(100) at 500 °C by metal organic chemical vapor deposition (MOCVD) starting from Dy((iPrN)2CNMe2)3 in an N2/O2 atmosphere. The above route yielded uniform and homogeneous nanostructured Dy2O3 films characterized by a remarkable reactivity towards atmospheric CO2 and H2O, resulting in the surface co-presence of dysprosium carbonates/ bicarbonates and hydroxides. The most relevant spectral features are presented and discussed.
2007
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/152337
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