Recent results obtained at LUXOR on the development of a-periodic ML coatings for applications in EUV lithography, space science, and attoscience are shortly presented. In addition to this characterization techniques of the designed structures developed in order to recover both secondary electron photoemission and phase are described.
Extreme Ultraviolet Optical Coatings Development at Luxor
NICOLOSI, PIERGIORGIO;M. G. PELIZZO;
2009
Abstract
Recent results obtained at LUXOR on the development of a-periodic ML coatings for applications in EUV lithography, space science, and attoscience are shortly presented. In addition to this characterization techniques of the designed structures developed in order to recover both secondary electron photoemission and phase are described.File in questo prodotto:
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