SiOx-Based Multilayer Barrier Coatings Produced by a Single PECVD Process

Multilayer organic/inorganic gas barrier coatings on plastics are needed for high performance demanding applications from OLEDs to packaging. In order to simplify the multilayer deposition process, we developed a single step vacuum process where silicon oxide-based PECVD multilayers are obtained by the modulation of the hexamethyldisiloxane (HMDSO) precursor inlet and interfaces are controlled by pumping speed. In this way, depending on O2/HMDSO ratio, ‘ceramic’ or ‘polymeric’ layers are deposited, with nanometre control of thickness of layers and interfaces. Permeability behaviour of the multilayer structures obtained is described as a function of the number of layers and their thickness.