Abstract We studied the Soft Breakdown (SB) in ultra-thin gate oxides (< 3 nm) subjected to Constant Current Stress. SB current derives from the superposition of two Random Telegraph Signal noises with different time constants. The current noise power density follows the 1/f power law over a wide range of frequency (1 Hz - 100 kHz). Moreover, the discrete fluctuations typical of SB are statistically independent events at least over time periods around hundreds of seconds, according to a Poisson process.

Switching Behaviour and Noise of Soft Breakdown Current in Ultra-Thin Gate Oxide

CESTER, ANDREA;PACCAGNELLA, ALESSANDRO;
2000

Abstract

Abstract We studied the Soft Breakdown (SB) in ultra-thin gate oxides (< 3 nm) subjected to Constant Current Stress. SB current derives from the superposition of two Random Telegraph Signal noises with different time constants. The current noise power density follows the 1/f power law over a wide range of frequency (1 Hz - 100 kHz). Moreover, the discrete fluctuations typical of SB are statistically independent events at least over time periods around hundreds of seconds, according to a Poisson process.
2000
Proceeding of the 30th European Solid-State Device Research Conference
2863322486
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2472751
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