Failure modes of bipolar Schottky logic devices due to metallurgical degradation of PtSi/Ti-W/Al contacts were studied. Both to the purpose prepared wafers and commercial 74LSOO TTL Low-Power Schottky devices were used. Metallurgical failures are primarily due to Al diffusion through the Ti-W barrier layer. As a consequence, thermal treatments induce electrical failures which begin with a loss of fan-out followed by longer rise and fall switching times. Finally complete device failure is observed when the output stays always at the high logic level. Emitter-base leakages and short-circuits, due to Si dissolution in the overlaying metal system, can explain the observed electrical degradations which are markedly delayed by a thin oxygen layer present at the Al/Ti-W interface.

Bipolar Schottky logic device failure modes due to contact metallurgical degradation

ZANONI, ENRICO
1982

Abstract

Failure modes of bipolar Schottky logic devices due to metallurgical degradation of PtSi/Ti-W/Al contacts were studied. Both to the purpose prepared wafers and commercial 74LSOO TTL Low-Power Schottky devices were used. Metallurgical failures are primarily due to Al diffusion through the Ti-W barrier layer. As a consequence, thermal treatments induce electrical failures which begin with a loss of fan-out followed by longer rise and fall switching times. Finally complete device failure is observed when the output stays always at the high logic level. Emitter-base leakages and short-circuits, due to Si dissolution in the overlaying metal system, can explain the observed electrical degradations which are markedly delayed by a thin oxygen layer present at the Al/Ti-W interface.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2514358
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