Using the Y-function method, this paper experimentally investigates the effects of total ionizing dose up to 1 Grad on the channel mobility of a commercial 28-nm bulk CMOS process.

Mobility Degradation of 28-nm Bulk MOSFETs Irradiated to Ultrahigh Total Ionizing Doses

Mattiazzo, S;
2018

Abstract

Using the Y-function method, this paper experimentally investigates the effects of total ionizing dose up to 1 Grad on the channel mobility of a commercial 28-nm bulk CMOS process.
2018
2018 IEEE International Conference on Integrated Circuits, Technologies and Applications Proceedings
1st IEEE International Conference on Integrated Circuits, Technologies and Applications, ICTA 2018
9781538665503
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/3316597
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