We studied the Soft Breakdown (SB) in ultra-thin gate oxides (< 3 nm) subjected to Constant Current Stress. SB current derives from the superposition of two Random Telegraph Signal noises with different time constants. The current noise power density follows the 1/f power law over a wide range of frequency (1 Hz - 100 kHz).

Soft Breakdown in Ultra-Thin gate oxide after constant current Stress

CESTER, ANDREA;A. PACCAGNELLA;
2000

Abstract

We studied the Soft Breakdown (SB) in ultra-thin gate oxides (< 3 nm) subjected to Constant Current Stress. SB current derives from the superposition of two Random Telegraph Signal noises with different time constants. The current noise power density follows the 1/f power law over a wide range of frequency (1 Hz - 100 kHz).
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/1341507
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