Amorphous nanoclusters of titanium silicides have been synthesized by implanting 30 keV-titanium ions, at a fluence of 1x10(17) cm(-2) in amorphous silica. The cluster stoichiometry was [Ti]/[Si]=1.1+/-0.3, as obtained by energy dispersive spectroscopic (EDS) x-ray micro-analysis and confirmed by x-ray photoelectron spectroscopy (XPS) analysis. Titanium implanted ions react with the host silica matrix leading to the formation of chemical bonds with silicon.

Chemical interactions in titanium-implanted fused silica

BERTONCELLO, RENZO;BATTAGLIN, GIANCARLO;CATTARUZZA, ELTI;GONELLA, FRANCESCO;MATTEI, GIOVANNI;MAZZOLDI, PAOLO;
1995

Abstract

Amorphous nanoclusters of titanium silicides have been synthesized by implanting 30 keV-titanium ions, at a fluence of 1x10(17) cm(-2) in amorphous silica. The cluster stoichiometry was [Ti]/[Si]=1.1+/-0.3, as obtained by energy dispersive spectroscopic (EDS) x-ray micro-analysis and confirmed by x-ray photoelectron spectroscopy (XPS) analysis. Titanium implanted ions react with the host silica matrix leading to the formation of chemical bonds with silicon.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/144099
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