Top-down and bottom-up nanofabrication for multipurpose applications

In this article we will show three recent examples of combined strategies aiming at merging top-down and bottom-up approach for nanofabrication at nanoscale level. The first example shows the fabrication of nanogaps performed by Focus Ion Beam technique that have been used to measure the conducivity of few gold nanoparticles aggregates deposited by Dip Pen lithography. The second example deals with the parallel replica of high resolution master generated by Electron Beam Lithography by means of an innovative lithographic process based on DNA supramolecular nano-stamping. The latter example proposes the possibility to generate, through radiation exposure, direct patterning of hybrid sol-gel material doped with fluorescent molecules. The outline of the fabrication approaches and their scientifical and technical perspective are discussed.