An insight into the benefits and challenges of FinFET based multi-gate devices is presented. The roles of the device geometry and the three-dimensional architecture are investigated

Multi-gate devices for the 32-nm node and beyond: advantages and issues

GRIFFONI, ALESSIO;PACCAGNELLA, ALESSANDRO;MENEGHESSO, GAUDENZIO
2008

Abstract

An insight into the benefits and challenges of FinFET based multi-gate devices is presented. The roles of the device geometry and the three-dimensional architecture are investigated
2008
9788861292963
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2273247
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