We report on a photosensitive hybrid material based on 3-glycidoxypropyltrimethoxysilane (GPTMS) and on the cationic photopolymerization of the epoxide groups. In particular, we describe the synthesis and fabrication of patterned waveguide structures by ultraviolet (UV) irradiation through a quartz slide with a metallic mask. An increase of 0.01 of the material refractive index has been measured when the film is exposed to UV light in the range of 220–260 nm. The surface morphology and the optical properties of the structures are reported.
Direct pattern of photocurable glycidoxypropyltrimethoxysilane based sol-gel hybrid waveguides for photonic applications
BRUSATIN, GIOVANNA;DELLA GIUSTINA, GIOIA;GUGLIELMI, MASSIMO;
2007
Abstract
We report on a photosensitive hybrid material based on 3-glycidoxypropyltrimethoxysilane (GPTMS) and on the cationic photopolymerization of the epoxide groups. In particular, we describe the synthesis and fabrication of patterned waveguide structures by ultraviolet (UV) irradiation through a quartz slide with a metallic mask. An increase of 0.01 of the material refractive index has been measured when the film is exposed to UV light in the range of 220–260 nm. The surface morphology and the optical properties of the structures are reported.File in questo prodotto:
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