X-ray photoelectron diffraction (XPD) has been applied to the study of the surface-(s)-V2O3 (2 × 2) layer on Pd(1 1 1), which is a novel interface-stabilised vanadium oxide phase with no bulk oxide counterpart. It has been detected by scanning tunnelling microscopy (STM) during the growth of ultrathin films of vanadium oxide on Pd(1 1 1). XPD confirms the general features of the model for s-V2O3/Pd(1 1 1), which has been proposed previously on the basis of STM measurements and ab initio density-functional-theory (DFT) calculations. In addition, quantitative agreement is found between the DFT model and the XPD experiment in the estimate of the average V–O interlayer spacing: the experimental result is 0.72±0.07 Å, while the DFT-derived value is 0.723 Å.

A photoelectron diffraction study of the surface-V2O3 (2 x 2) layer on Pd(111)

SAMBI, MAURO;RIZZI, GIAN-ANDREA;GRANOZZI, GAETANO
2003

Abstract

X-ray photoelectron diffraction (XPD) has been applied to the study of the surface-(s)-V2O3 (2 × 2) layer on Pd(1 1 1), which is a novel interface-stabilised vanadium oxide phase with no bulk oxide counterpart. It has been detected by scanning tunnelling microscopy (STM) during the growth of ultrathin films of vanadium oxide on Pd(1 1 1). XPD confirms the general features of the model for s-V2O3/Pd(1 1 1), which has been proposed previously on the basis of STM measurements and ab initio density-functional-theory (DFT) calculations. In addition, quantitative agreement is found between the DFT model and the XPD experiment in the estimate of the average V–O interlayer spacing: the experimental result is 0.72±0.07 Å, while the DFT-derived value is 0.723 Å.
2003
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2455835
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