Experimental results on the realization of Mo/Si multilayer mirrors for EUV applications are presented. The multilayers have been deposited using RF-magnetron sputtering. The characterization of single layers and multilayers has been performed using different physical techniques. The reflectivity of multilayer mirrors optimised for 13 and 19 nm radiation has been measured and compared to simulation.

First realization and characterization of multilayer EUV reflective coatings

NICOLOSI, PIERGIORGIO;PATELLI, ALESSANDRO;PELIZZO, MARIA-GUGLIELMINA;MAGGIONI, GIANLUIGI;MATTEI, GIOVANNI;POLETTO, LUCA;MAZZOLDI, PAOLO;TONDELLO, GIUSEPPE
2001

Abstract

Experimental results on the realization of Mo/Si multilayer mirrors for EUV applications are presented. The multilayers have been deposited using RF-magnetron sputtering. The characterization of single layers and multilayers has been performed using different physical techniques. The reflectivity of multilayer mirrors optimised for 13 and 19 nm radiation has been measured and compared to simulation.
Soft X-Ray and EUV Imaging Systems IIl Society for Optical Engineering
9780819442208
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11577/2457228
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