This Letter reports an X-ray photoelectron diffraction study of ∼5 V monolayers deposited by electron beam evaporation at the TiO2(110) surface. Data clearly show that V grows as islands with a bcc structure having the [100] direction normal to the substrate surface. A detailed analysis of the V″2p and Ti″3p azimuthal curves indicates also an alignment of the [001] overlayer azimuth with the [1¯10] direction of the TiO2 substrate. These results are consistent with an epitaxial growth of bcc V at the TiO2(110) surface where a double V surface unit cell is matched to the TiO2(110) rectangular cell.

Photoelectron diffraction study on the structure of a vanadium ultrathin film deposited at the TiO2(110) surface

SAMBI, MAURO;GRANOZZI, GAETANO;
1996

Abstract

This Letter reports an X-ray photoelectron diffraction study of ∼5 V monolayers deposited by electron beam evaporation at the TiO2(110) surface. Data clearly show that V grows as islands with a bcc structure having the [100] direction normal to the substrate surface. A detailed analysis of the V″2p and Ti″3p azimuthal curves indicates also an alignment of the [001] overlayer azimuth with the [1¯10] direction of the TiO2 substrate. These results are consistent with an epitaxial growth of bcc V at the TiO2(110) surface where a double V surface unit cell is matched to the TiO2(110) rectangular cell.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2464193
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