Thin films of polycarbosilane were deposited on Si and SiO2 substrates. Instead of conventional oven annealing (high temperatures, inert atmosphere), laser pyrolysis was used to achieve the polymer-to-ceramic conversion. In some conditions, especially when laser radiation absorption was enhanced by depositing a carbon layer on the surface of as-deposited films or by embedding graphite particles, this processing method yielded SiC ceramic coatings, without damaging the substrate. Processing in air or low vacuum did not result in oxidized coatings, contrary to what happens for oven pyrolysis. Laser-converted films were similar to oven-heated films processed at 1000° to 1200°C.

Silicon carbide films by laser pyrolysis of polycarbosilane

COLOMBO, PAOLO;MARTUCCI, ALESSANDRO;VILLORESI, PAOLO
2001

Abstract

Thin films of polycarbosilane were deposited on Si and SiO2 substrates. Instead of conventional oven annealing (high temperatures, inert atmosphere), laser pyrolysis was used to achieve the polymer-to-ceramic conversion. In some conditions, especially when laser radiation absorption was enhanced by depositing a carbon layer on the surface of as-deposited films or by embedding graphite particles, this processing method yielded SiC ceramic coatings, without damaging the substrate. Processing in air or low vacuum did not result in oxidized coatings, contrary to what happens for oven pyrolysis. Laser-converted films were similar to oven-heated films processed at 1000° to 1200°C.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2465601
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