Electron beam lithography of hybrid sol-gel negative resist

The direct pattering process here described is proposed as an alternative to conventional multi step nano-fabrication techniques, merging materials with novel functional properties and the simplification of the fabrication processes. We report the use of an innovative hybrid sol-gel material working as negative resists for EBL lithography and showing a resolution better than 100 nm. Tailoring the optical and mechanical properties, few examples of photonic nanostructure were fabricated with a simple e-beam exposure that greatly simplify the nanofabrication process. (C) 2008 Elsevier B.V. All rights reserved.