We study the transport of alkali-metal ions in oxide glasses at low temperature under electron irradiation in connection with the onset of percolation through structurally relaxed SiO2 units. The relaxation of the SiO2 units forming a path for cation motion and the obtained low value for the critical exponent governing the ion diffusion coefficient are discussed.

Network Relaxation Processes Governing Alkali-metal Transport In Electron-irradiated Glasses

TOIGO, FLAVIO
1987

Abstract

We study the transport of alkali-metal ions in oxide glasses at low temperature under electron irradiation in connection with the onset of percolation through structurally relaxed SiO2 units. The relaxation of the SiO2 units forming a path for cation motion and the obtained low value for the critical exponent governing the ion diffusion coefficient are discussed.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2503406
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