We study the transport of alkali-metal ions in oxide glasses at low temperature under electron irradiation in connection with the onset of percolation through structurally relaxed SiO2 units. The relaxation of the SiO2 units forming a path for cation motion and the obtained low value for the critical exponent governing the ion diffusion coefficient are discussed.
Network Relaxation Processes Governing Alkali-metal Transport In Electron-irradiated Glasses
TOIGO, FLAVIO
1987
Abstract
We study the transport of alkali-metal ions in oxide glasses at low temperature under electron irradiation in connection with the onset of percolation through structurally relaxed SiO2 units. The relaxation of the SiO2 units forming a path for cation motion and the obtained low value for the critical exponent governing the ion diffusion coefficient are discussed.File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.