Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneat

Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

CORSO, ALAIN JODY;NICOLOSI, PIERGIORGIO;NARDELLO, MARCO;PELIZZO, MARIA-GUGLIELMINA
2013

Abstract

Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneat
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11577/2622244
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