Optical and structural properties of Niobium and Zirconium bilayer structures (Nb/Zr and Zr/Nb) were investigated in order to develop free-standing transmittance filters in the Extreme Ultraviolet region (EUV) between 5-20 nm. Samples of Nb/Zr and Zr/Nb were deposited on Silicon Nitride (Si3N4) membranes by magnetron sputtering technique, using metallic targets of Nb and Zr. A single layer of Zr and Nb on Si3N4 membrane has also been deposited and studied for a better understanding of the performance of these structures and their optical and mechanical properties. Optical microscope images of Zr and Zr/Nb structures on the membranes reveal compressive stress while Nb and Nb/Zr structures present tensile stress behavior. Nb and Nb/Zr self-standing filters were obtained by etching the silicon nitride membrane, with free-standing areas up to 3 × 3 mm2 with 100 nm of thickness. The transmittance performance of the samples has been measured by using EUV synchrotron radiation. The results show the highest peak transmittance of 60% at 7.02 nm and very good performance in the targeted range.

Extreme ultraviolet free-standing transmittance filters for high brilliance sources, based on Nb/Zr and Zr/Nb thin films on Si3N4 membranes: Design, fabrication, optical and structural characterization

Jimenez, K.
Investigation
;
Nicolosi, P.
Supervision
;
Juschkin, L.
Membro del Collaboration Group
;
Ahmed, Nadeem
Membro del Collaboration Group
;
Gaballah, A. E. H.
Membro del Collaboration Group
;
Cattaruzza, E.
Membro del Collaboration Group
;
Sertsu, M. G.
Membro del Collaboration Group
;
Zuppella, P.
Investigation
2019

Abstract

Optical and structural properties of Niobium and Zirconium bilayer structures (Nb/Zr and Zr/Nb) were investigated in order to develop free-standing transmittance filters in the Extreme Ultraviolet region (EUV) between 5-20 nm. Samples of Nb/Zr and Zr/Nb were deposited on Silicon Nitride (Si3N4) membranes by magnetron sputtering technique, using metallic targets of Nb and Zr. A single layer of Zr and Nb on Si3N4 membrane has also been deposited and studied for a better understanding of the performance of these structures and their optical and mechanical properties. Optical microscope images of Zr and Zr/Nb structures on the membranes reveal compressive stress while Nb and Nb/Zr structures present tensile stress behavior. Nb and Nb/Zr self-standing filters were obtained by etching the silicon nitride membrane, with free-standing areas up to 3 × 3 mm2 with 100 nm of thickness. The transmittance performance of the samples has been measured by using EUV synchrotron radiation. The results show the highest peak transmittance of 60% at 7.02 nm and very good performance in the targeted range.
2019
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/3332874
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