Here, we show research innovation in radiation-matter interaction, with possible photonics and optoelectronics applications in building and maintenance of graphene-based devices, as well as a further confirmation for soft x-ray irradiation as a clean route towards graphene photoreduction. Thus, we have investigated the soft x-rays exposure effects on graphene/nickel samples damaged by nanosecond 1064 nm Nd:YAG laser under laser fluence above the damage threshold. In this regard, NEXAFS analyses reveal the typical GO features in the C K edge spectra of the irradiated specimens. Moreover, the continuous exposures to soft x-rays radiation show the photo-reduction process monitored by NEXAFS in real time. Ten-hour soft x-ray exposure moves the spectra towards the typical one of the graphene.

Stability and extreme ultraviolet photo-reduction of graphene during C-K edge NEXAFS characterization

Gerlin F.;Zuppella P.;Corso A. J.;Nardello M.;Tessarolo E.;Bacco D.;Pelizzo M. G.
2016

Abstract

Here, we show research innovation in radiation-matter interaction, with possible photonics and optoelectronics applications in building and maintenance of graphene-based devices, as well as a further confirmation for soft x-ray irradiation as a clean route towards graphene photoreduction. Thus, we have investigated the soft x-rays exposure effects on graphene/nickel samples damaged by nanosecond 1064 nm Nd:YAG laser under laser fluence above the damage threshold. In this regard, NEXAFS analyses reveal the typical GO features in the C K edge spectra of the irradiated specimens. Moreover, the continuous exposures to soft x-rays radiation show the photo-reduction process monitored by NEXAFS in real time. Ten-hour soft x-ray exposure moves the spectra towards the typical one of the graphene.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/3457108
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