A volatile molybdenyl complex of formula MoO2(dpm)2 has been studied as a precursor for MOCVD of MoO3 films. Qualitative indications on the possible decomposition path were obtained by mass spectrometry and thermal analysis. Good quality films were deposited using Pt and Si(100) as substrates. The films were characterised by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), IR and UV-VIS spectroscopies.
MoO3 thin films prepared via MOCVD from a volatile molybdenyl complex
RIZZI, GIAN-ANDREA;TONDELLO, EUGENIO
1995
Abstract
A volatile molybdenyl complex of formula MoO2(dpm)2 has been studied as a precursor for MOCVD of MoO3 films. Qualitative indications on the possible decomposition path were obtained by mass spectrometry and thermal analysis. Good quality films were deposited using Pt and Si(100) as substrates. The films were characterised by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), IR and UV-VIS spectroscopies.
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