Amorphous nanoclusters of chromium and titanium silicides have been synthesized by implanting 35 keV chromium and 30 keV titanium ions, at a fluence of 1X10(17) cm(-2) in amorphous silica. The cluster stoichiometries were [Cr]/[Si]=1.6+/-0.3 and [Ti]/[Si]=1.1+/-0.3, respectively, as obtained by energy dispersive spectroscopic x-ray microanalysis and confirmed by x-ray photoelectron spectroscopy analysis, Titanium-implanted ions are more reactive than chromium ones in terms of the formation of chemical bonds with silicon of the host silica matrix. (C) 1995 American Institute of Physics.
Formation of amorphous silicide nanoclusters in chromium- and titanium-implanted silica
BATTAGLIN, GIANCARLO;BERTONCELLO, RENZO;MATTEI, GIOVANNI;MAZZOLDI, PAOLO;
1995
Abstract
Amorphous nanoclusters of chromium and titanium silicides have been synthesized by implanting 35 keV chromium and 30 keV titanium ions, at a fluence of 1X10(17) cm(-2) in amorphous silica. The cluster stoichiometries were [Cr]/[Si]=1.6+/-0.3 and [Ti]/[Si]=1.1+/-0.3, respectively, as obtained by energy dispersive spectroscopic x-ray microanalysis and confirmed by x-ray photoelectron spectroscopy analysis, Titanium-implanted ions are more reactive than chromium ones in terms of the formation of chemical bonds with silicon of the host silica matrix. (C) 1995 American Institute of Physics.File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
