The influence of temperature on deuterium or hydrogen diffusion in GaAsN is investigated by secondary ion mass spectrometry and photoluminescence PL. Deuterium incorporation at 200 °C leads to an extremely sharp D concentration profile, which decreases by a factor of 10 within 5 nm. This has great relevance to the attainment of an in-plane band gap engineering of dilute nitrides as demonstrated by PL in ensembles of artificial GaAsN wires.

Effect of hydrogen incorporation temperature in in plane-engineered GaAsN/GaAsN.H heterostructures

BISOGNIN, GABRIELE;BERTI, MARINA;
2008

Abstract

The influence of temperature on deuterium or hydrogen diffusion in GaAsN is investigated by secondary ion mass spectrometry and photoluminescence PL. Deuterium incorporation at 200 °C leads to an extremely sharp D concentration profile, which decreases by a factor of 10 within 5 nm. This has great relevance to the attainment of an in-plane band gap engineering of dilute nitrides as demonstrated by PL in ensembles of artificial GaAsN wires.
2008
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2265088
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