In the present paper we combined ion implantation and nanosphere lithography to regularly dope, by a mask-assisted process, a SiO2 substrate with rare earth ions (Er) by ion implantation and to fabricate by sputtering a plasmonic 2D periodic array of Au nanostructures on the silica surface spatially coupled to the implanted Er3+ ions. The aim of this work is to study how Er3+ emission at 1.5 lm can be affected by the interaction with a plasmonic nanostructure. In particular we have found a variation of the radiative lifetime of the Er3+ emission and a change from single exponential to bi-exponential of the luminescence intensity decay.

Nanopatterning of silica with mask-assisted ion implantation

PEROTTO, GIOVANNI;BELLO, VALENTINA;CESCA, TIZIANA;MATTEI, GIOVANNI;MAZZOLDI, PAOLO;PELLEGRINI, GIOVANNI;SCIAN, CARLO
2010

Abstract

In the present paper we combined ion implantation and nanosphere lithography to regularly dope, by a mask-assisted process, a SiO2 substrate with rare earth ions (Er) by ion implantation and to fabricate by sputtering a plasmonic 2D periodic array of Au nanostructures on the silica surface spatially coupled to the implanted Er3+ ions. The aim of this work is to study how Er3+ emission at 1.5 lm can be affected by the interaction with a plasmonic nanostructure. In particular we have found a variation of the radiative lifetime of the Er3+ emission and a change from single exponential to bi-exponential of the luminescence intensity decay.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2441081
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