An analytical evaluation of the distribution of the current density both along the gate finger and perpendicular to the metal/semiconductor interface in MESFET transistors is reported for forward-biased gate junctions. Examples are given for two gate resistances per unit length to evidence the current crowding effect which appears near the gate pad on increasing the gate resistance.

Evaluation of Current-density Distribution In Mesfet Gates

ZANONI, ENRICO
1986

Abstract

An analytical evaluation of the distribution of the current density both along the gate finger and perpendicular to the metal/semiconductor interface in MESFET transistors is reported for forward-biased gate junctions. Examples are given for two gate resistances per unit length to evidence the current crowding effect which appears near the gate pad on increasing the gate resistance.
1986
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2514044
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