Random telegraph noise (RTN) and pre-breakdown bursts in gate current are studied in time domain in degraded AlGaN/GaN HEMTs subjected to reverse bias stress. Analysis of RTN under both forward and reverse gate bias indicates that the origin of RTN is due to modulation of current via a stress-induced percolation path by a trap. At voltages close to the device breakdown voltage, large amplitude pre-breakdown bursts have been observed. Their origin is discussed in terms of dielectric wear out of passivation layer at the gate edge.

Random Telegraph Noise And Bursts In Reverse-Bias-Stressed AlGaN/Gan HEMTs

MENEGHINI, MATTEO;MENEGHESSO, GAUDENZIO;ZANONI, ENRICO;
2012

Abstract

Random telegraph noise (RTN) and pre-breakdown bursts in gate current are studied in time domain in degraded AlGaN/GaN HEMTs subjected to reverse bias stress. Analysis of RTN under both forward and reverse gate bias indicates that the origin of RTN is due to modulation of current via a stress-induced percolation path by a trap. At voltages close to the device breakdown voltage, large amplitude pre-breakdown bursts have been observed. Their origin is discussed in terms of dielectric wear out of passivation layer at the gate edge.
2012
36th Workshop on Compound Semiconductor Devices and Integrated Circuits, WOCSDICE 2012
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/2521051
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