In this paper we analyze the conduction properties, charge trapping and threshold voltage instability of normally-on beta-Ga2O3 lateral MOSFETs for high power applications by means of threshold voltage transients. We found that a positive bias applied to the gate induces a rightward shift in the threshold voltage, caused by the trapping of electrons at border traps close to the semiconductor-dielectric interface.The amount of trapped charge was investigated by an innovative fast-CV experimental setup and was found to follow a logarithmic kinetic in time, modeled by a generalization of the inhibition model that takes into account the effect of columbic repulsion in stress conditions.Then, we developed a model for the gate conduction based on temperature dependent I-G-V-G characteristics. We detected that the gate current characterized in temperature and bias conditions similar to the ones used for the stress is dominated by Poole-Frenkel conduction assisted by a deep level at E-C - 0.12 eV.

CONDUCTION PROPERTIES AND THRESHOLD VOLTAGE INSTABILITY IN beta-Ga2O3 MOSFETs

Fregolent, M;De Santi, C;Meneghesso, G;Zanoni, E;Meneghini, M
2022

Abstract

In this paper we analyze the conduction properties, charge trapping and threshold voltage instability of normally-on beta-Ga2O3 lateral MOSFETs for high power applications by means of threshold voltage transients. We found that a positive bias applied to the gate induces a rightward shift in the threshold voltage, caused by the trapping of electrons at border traps close to the semiconductor-dielectric interface.The amount of trapped charge was investigated by an innovative fast-CV experimental setup and was found to follow a logarithmic kinetic in time, modeled by a generalization of the inhibition model that takes into account the effect of columbic repulsion in stress conditions.Then, we developed a model for the gate conduction based on temperature dependent I-G-V-G characteristics. We detected that the gate current characterized in temperature and bias conditions similar to the ones used for the stress is dominated by Poole-Frenkel conduction assisted by a deep level at E-C - 0.12 eV.
2022
Proceedings Volume 12002, Oxide-based Materials and Devices XIII
9781510648753
9781510648760
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11577/3455442
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